Sistemi sa fizičkim taloženjem pare

Konvencionalne kategorije vakuum procesa taloženja uključuju hemijska taloženja pare (Chemical vapor deposition CVD) fizičko taloženje pare (Physical vapor deposition PVD), isparavanje kroz vakuum sublimacije, ili povremeno, neku kombinaciju prethodno pomenutih metoda. Ovo su samo neki od načna razvoja tankog filma. Fizičko taloženje (Physical vapor deposition PVD) opisuje različite metode vakuum taloženja koje se mogu koristiti za proizvodnju tankih filmova. PVD koristi fizički proces (grejanje ili prskanje) da proizvede paru materijala, koji se potom polaže na objekat koji zahteva prevlaku. PVD se koristi u proizvodnji artikala koji zahtevaju tanak film za mehaničke, otpičke, hemijske ili elektronske funkcije. U okviru PVD sistema (Physical vapor deposition) Kvark, kao predstavnik svetske Američke kompanije TORR International Inc., specijaliste u oblasti nanotehnologije i tehnologije tankog filma, Vam nudi razne bazične i nadogradive sisteme, izrađene po specifičnoj potrebi korisnika:

  • Sputtering system (Magnetron i Ion beam system),
  • Evaporation system (Electron beam i Resistive thermal evaporation system),
  • Combination system (prilagođeni sistemi).

Magnetron sistemi praska, koriste se za aplikacije raznovrsnih priprema uzoraka za skeniranje pomoću elektonskih mikroskopa ili istraživanje i razvoj sa metalnim, dielektričnim i polimer filmovima. TORR International Inc. proizvodi prilagođene multi target sofisticirane sisteme za posebne primene.


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