Torr International’s Compact Research Coater (model number CRC- 600) Sputtering System is a manual planar magnetron sputtering system designed for the nanotechnology research environment.
This fast and affordable high-rate sputtering system provides excellent film quality in a surprisingly small footprint. The CRC-600 can be used to develop deposition processes for materials including aluminum, carbon, chromium, gold, Teflon®, silicon dioxide, tantalum, tungsten and titanium.
Since the two-inch targets can be changed quickly, the CRC-600 is easily reconfigured for applications requiring a different series of deposited materials. The 150mm substrate platform and 300mm vacuum chamber accommodates wafers up to six inches in diameter, as well as irregularly shaped substrates.