Chemical vapor deposition systems

Conventional categories of vacuum vapor deposition include chemical vapor deposition (CVD), physical vapor deposition (PVD), evaporation through vacuum sublimation, or occasionally a combination of the aforementioned methods. These are just some of the ways to develop a thin film.

As a representative of the world American company TORR International Inc., a specialist in the field of nanotechnology and thin film technology, Quark offers a variety of solutions, which you can see below.

Chemical vapor deposition (CVD) is a chemical process used to produce high quality, high performance solids. In a typical process, the substrate is exposed to one or more volatile precursors, which react and / or decompose on the surface of the substrate to produce the desired deposit.

Within the CVD (Chemical vapor deposition) system, Kvark offers you various basic and upgradeable systems, made according to the specific needs of the user:

• Atomic layer deposition system
• CVD, PECVD, MOCVD systems