Torr International Services LLC manufactures Reactive Ion Etchers designed for etching films of oxides, nitrides, polymers and more. Our standard RIE Series Plasma Etching System accommodates wafers / samples of up to 200mm diameter. Our custom RIE systems can handle a variety of sample sizes based on geometry and research Needs.

Reactive Ion Etchers can be manually or PC controlled, and can be table-top or stand-alone cabinet systems.